Handbook for Cleaning for Semiconductor Manufacturing: Fundamentals and Applications
| Author | : | |
| Rating | : | 4.47 (993 Votes) |
| Asin | : | 0470625953 |
| Format Type | : | paperback |
| Number of Pages | : | 590 Pages |
| Publish Date | : | 2015-11-09 |
| Language | : | English |
DESCRIPTION:
My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." —Randy Wallace, Department Head, Discovery Park Library, University of North Texas. From the Reviews"This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. This comprehensive volume pr
Chih-Jung, Ni said Five Stars. Excellent
He is a member of the International Technology Roadmap for Semiconductors.. Prior to forming a consulting company, Karen was employed at Novellus Systems, AMD, and Cypress Semiconductor. Reinhardt is Principle Consultant at Cameo Consulting in San Jose, California. She has published more than 30 technical publications, has been awarded seven patents, and is co-editor of Handbook of Silicon Wafer Cleaning Technology.Richard F. Karen A. Reidy (Ph.D., Penn State) is int